Porous Silicon
Multilayer Infrared Bandpass Filters
Xiang Zheng Tu
Nowadays
many people with diabetes need to measure their blood glucose levels by
pricking their fingers, squeezing drops of blood onto test strips, and
processing the results with portable glucometers. The process can be
uncomfortable, messy and often has to be repeated several times every day.
In
order to help improve the lives of millions of people by enabling them to
constantly monitor their glucose levels without the need for an implant, non-invasive
measurement approaches of blood glucose concentration based on absorption
measurements in the infrared region have been explored many years. Among them
is a micro-optical-mechanical-electro-system (MOMES)-based non-invasive blood
glucose monitor designed by the present author ten years ago, as shown in the
above figure.
The
monitor comprises a micromachined infrared optical filter array, a
micromachined infrared mechanical modulator array, at least one micromachined
infrared tunable filter, and at least one infrared detector. Each optical
filter is aligned with a mechanical modulator along its optical axis direction.
The optical filter continuously divides a monochromatic infrared light in a
wavelength range within 0.8 to 25 micron from an infrared light. The aligned
mechanical modulator turns the monochromatic infrared light into an alternating
monochromatic infrared light. The tunable filter is aligned with the infrared
detector along its optical axis direction. The tunable filter selects the
back-diffused alternating monochromatic infrared light emitted from a measured
blood subject that is illuminated by the alternating monochromatic infrared
light. The infrared detector converts the back-diffused alternating
monochromatic infrared light into an alternating electronic signal. Then a
photo-integrated circuit (IC) combines with the infrared detector for
synchronous detection and amplification of the electronic signal generated by
the synchronous detection.
The
micromachined infrared optical filter could be a porous silicon multilayer
infrared pass band filter, reference to the above figure. The basis of the
porous silicon filter is the same as in a common interference filter. The main
difference is that in the porous silicon filter the difference in refractive
indices is caused by different porosities of porous silicon layers, not
different layers of different materials as in common interference filters. The
porous silicon multilayers are produced by changing one of the etching
parameters periodically. Etching parameters that affect the morphology and
pores’ depth are current density, electrolyte composition, sample’s doping, etc.
Once a porous silicon layer is formed anodization stops in this layer and only
proceeds in pore tips. The porosity of layers depends only on current density
when other etching parameters are kept fixed so that changing the current
density results in layers with different porosities in depth of sample.
The
porous silicon multilayer shown in the above figure can be expressed as:
(LH
)mLL (HL)m-1 H
(1)
where
L denotes a layer with low refractive index and H denotes a layer with high
refractive index, m is the numbers of repeating periods. Optical thickness of L
and H Layers in bandpass interference filter should be equal to one fourth of
peak wavelength:
nLdL
= nHdH = λp/4
(2)
where
nL is refractive index and dL
physical thickness of L layers, similarly nH and dH
correspond to H layers, and λp is a peak wavelength.
The
effective refractive index of porous silicon layer, n, depends on its porosity.
The refractive index is almost a linear function of porosity. Bruggeman
approximation is used to determine the effective refractive index of porous
silicon layer:
n =
(1 - p) ( ɛsi - ɛpsi ) / (ɛsi + 2 ɛpsi )
+ p (ɛair – 2 ɛpsi ) / (ɛair + 2 ɛpsi ) (3)
where
p is the porosity, and ɛair, ɛsi, ɛpsi are the
dielectric constants of air, silicon, and porous silicon, respectively.
The
infrared light source shown in the above figure could comprise a resistive
heater positioned on the top of a membrane suspending over a cavity. All theses
elements of the device are constructed as a microstructure and integrated with
the porous silicon multilayer infrared bandpass filter in a same silicon
substrate. As can be seen in the figure the collimator is also formed in the
silicon substrate and positioned along the extending direction of the light
source and the porous bandpass filter. In this way the
micro-optical-mechanical-electro-system (MOMES)-based non-invasive blood
glucose monitor can be small in size, light in weight, compact in structure and
low in power consumption.